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Mechanism of oxygen reduction via chemical affinity in NiO/SiO2 interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication

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Nanoscale Horiz., 2025, 10,568-575
DOI: 10.1039/D4NH00460D, Communication
Mario Mery, Claudio Gonzalez-Fuentes, Igor Stanković, Jorge M. Nuñez, Jorge E. Valdés, Myriam H. Aguirre, Carlos García
We show that H+ irradiation significantly enhances the reduction of antiferromagnetic NiO into ferromagnetic Ni due to hydrogen's strong chemical affinity for oxygen. The selective removal of oxygen enables the formation of a high-purity Ni layer.
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