Mechanism of Oxygen Reduction via Chemical Affinity in NiO/SiO2 Interfaces Irradiated with keV Energy Hydrogen and Helium Ions for Heterostructure Fabrication

Nanoscale Horiz., 2024, Accepted Manuscript
DOI: 10.1039/D4NH00460D, Communication

Mario Mery, Claudio Gonzalez-Fuentes, Igor Stankovic, Jorge Martin Nuñez, Jorge E. Valdes, Myriam Haydee Aguirre, Carlos Garcia
Low-energy light ion beams are an essential resource in lithography for nanopatterning magnetic materials and interfaces due to their ability to modify the structure and properties of metamaterials. Here we...
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