XeF2 Gas Assisted Focused Electron Beam Induced Etching of Niobium Thin Films: Towards Direct Write Editing of Niobium Superconducting Devices

Nanoscale Horiz., 2024, Accepted Manuscript
DOI: 10.1039/D4NH00407H, Communication

Branden Spencer Gellerup, Reece Emery, Steven Randolph, Philip Rack, Scott Thomas Retterer
In this work, we explore focused electron beam induced etching (FEBIE) of niobium thin films with the XeF2 precursor as a route to edit, on-the-fly, superconducting devices. We report the...
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