Nanoscale Horiz., 2019, Advance Article
DOI: 10.1039/C8NH00305J, Communication
DOI: 10.1039/C8NH00305J, Communication
Yang Xu, Farzaneh Bahmani, Min Zhou, Yueliang Li, Chenglin Zhang, Feng Liang, Sayed Habib Kazemi, Ute Kaiser, Guowen Meng, Yong Lei
Expanded interlayer spacing and additionally exposed edges induced by defects of MoS2 enable facile K-intercalation, rapid K-transport and promoted K-adsorption.
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Expanded interlayer spacing and additionally exposed edges induced by defects of MoS2 enable facile K-intercalation, rapid K-transport and promoted K-adsorption.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry