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Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2

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Nanoscale Horiz., 2023, Accepted Manuscript
DOI: 10.1039/D3NH00358B, Communication
Mingxi Chen, J. W. Chai, Jing Wu, Haofei Zheng, Wen-ya Wu, James Lourembam, Ming Lin, Jun-young Kim, Jaewon Kim, Kah-Wee Ang, Man-Fai Ng, Henry Medina, Shi Wun Tong, Dongzhi Chi
Atomically-thin monolayer WS2 is a promising channel material for next-generation Moore’s nanoelectronics owing to its high theoretical room temperature electron mobility and immunity to short channel effect. The high photoluminescence...
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