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Patterning Submicron Photomechanical Features into Single Diarylethene Crystals Using Electron Beam Lithography

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Nanoscale Horiz., 2022, Accepted Manuscript
DOI: 10.1039/D2NH00205A, Communication
Wangxiang Li, Daichi Kitagawa, Seiya Kobatake, Elena Bekyarova, Christopher J. Bardeen
Lithography methods are commonly used to create structures in inorganic semiconductors like silicon but have not been widely applied to organic crystals. In this work, electron beam lithography (EBL) is...
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